http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104303273-B

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2013-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-104303273-B
titleOfInvention Engraving method and plasma processing apparatus
abstract In one embodiment, provide a kind of method for etching the etched layer containing polysilicon.The method includes:A () prepares the operation of processed matrix, this processed matrix has etched layer and the mask being located in this etched layer;B () uses the operation of this mask etching etched layer.Mask has:1st mask portion, it is made up of polysilicon;2nd mask portion, it is made up of silicon oxide, and between the 1st mask portion and described etched layer.In the operation of etching etched layer; supply into the process container being accommodated with processed matrix for the 1st gas etching etched layer, the 2nd gas of the deposit being attached to mask for removing and the 3rd gas for protection the 1st mask portion, generate plasma in process container.
priorityDate 2012-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419530954
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82247
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977

Total number of triples: 26.