http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104246614-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-388 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-548 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0751 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-5455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate | 2013-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104246614-B |
| titleOfInvention | Composition for forming silicon-containing extreme ultraviolet resist underlayer film containing additive |
| abstract | The invention aims to provide a composition for forming an extreme ultraviolet resist underlayer film, which has a good resist shape. Thus, provided is a resist underlayer film forming composition for extreme ultraviolet lithography, comprising a polysiloxane A containing a hydrolysis condensate of a hydrolyzable silane a, and a hydrolyzable silane compound b having a sulfonamide structure, a carboxamide structure, a urea structure, or an isocyanuric acid structure. Also provided is a resist underlayer film forming composition for extreme ultraviolet lithography, which contains polysiloxane B that contains a hydrolysis condensate of a hydrolyzable silane a and a hydrolyzable silane compound B that has a sulfonamide structure, a carboxamide structure, a urea structure, or an isocyanuric acid structure. The polysiloxane (A) is a cohydrolytic condensate of tetraalkoxysilane and alkyltrialkoxysilane and aryltrialkoxysilane. |
| priorityDate | 2012-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 593.