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filingDate 2014-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2014-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-104112635-A
titleOfInvention Cold spray barrier coated component of a plasma processing chamber and method of manufacture thereof
abstract The invention refers to a cold spray barrier coated component of a plasma processing chamber and a method of manufacture thereof. Concretely, the cold spray barrier coated component of a semiconductor plasma processing chamber comprises a substrate having at least one metal surface wherein a portion of the metal surface is configured to form an electrical contact. A cold spray barrier coating is formed from a thermally and electrically conductive material on at least the metal surface configured to form the electrical contact of the substrate. Further, the cold spray barrier coating may also be located on a plasma exposed and/or process gas exposed surface of the component.
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