| abstract |
According to one embodiment of the present invention, for substrate being carried out the substrate board treatment of technique, comprising: lower chamber, its opened upper end, and the passage for making described substrate pass in and out it is formed with in side；External reaction pipe, it is for closing the top opened wide in lower chamber, and provides the state space realizing technique；Substrate holder, it loads more than one described substrate with above-below direction, it is possible to be transformed into the mounting position loading described substrate in substrate holder or the process station that described substrate carries out technique；Gas supply unit, it supplies reactant gas to state space；And processing unit, it is arranged on the outside of external reaction pipe, and makes reactant gas activation that substrate is carried out technique. |