Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-146 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2652 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76237 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14643 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-0649 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4916 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14689 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-146 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-761 |
filingDate |
2013-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2016-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2016-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CN-103715211-B |
titleOfInvention |
Inject isolating device and forming method thereof |
abstract |
Inject isolating device and method thereof. A kind of device comprises that Semiconductor substrate and the end face from Semiconductor substrate extend to Semiconductor substrate and around the injection area of isolation of active region. Gate-dielectric is arranged on the active region top of Semiconductor substrate and extends to and injects area of isolation top. Gate electrode is arranged on gate-dielectric top, and two ends cover hard mask and injecting above area of isolation between gate-dielectric and gate electrode. Two ends cover hard mask and comprise the alloy identical with being injected into alloy in active region. |
priorityDate |
2012-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |