| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T156-10 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6833
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32798
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32477
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
2011-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2016-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-103026799-B |
| titleOfInvention |
In plasma processing chamber, parasitic plasma prevents |
| abstract |
Parasitic plasma in space in the assembly of plasma processing chamber can be eliminated by covering the conductive surface in the inside in this space with sleeve.This space can be pore in chamber component, lift pin holes, helium path, pipeline and or pumping chamber, this chamber component such as upper electrode and substrate support. |
| priorityDate |
2010-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |