http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101300667-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate | 2006-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4849e784f5a1668283fee199cb659c0b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a7582ca59e7cada28f93d3dec16f646 |
publicationDate | 2008-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-101300667-A |
titleOfInvention | Etching method and etching apparatus |
abstract | The invention provides an etching method and etching apparatus; the etching method is used for etching a layer to be processed which is formed on the surface of an object body. This etching method is characterized by comprising a resist-forming step wherein a resist layer is uniformly formed on the surface of the object body; a mask-forming step wherein a patterned etching mask is formed by providing the resist layer with a certain recess for etching; a plasma-resistant film-forming step wherein a plasma-resistant film is formed over the entire surface of the etching mask including the bottom and lateral surfaces of the recess for etching; a bottom part plasma-resistant film-removing step wherein the plasma-resistant film formed on the bottom surface of the recess for etching is removed; and a main etching step wherein the layer to be processed is etched by using the etching mask after the bottom part plasma-resistant film-removing step. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110858541-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110931354-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110858541-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110931354-A |
priorityDate | 2005-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.