reference/9973237

Predicate	Object
contentType	Journal Article
issn	1556-276X 1931-7573
issueIdentifier	1
pageRange	446-
publicationName	Nanoscale Research Letters
startingPage	446
bibliographicCitation	Ma S, Con C, Yavuz M, Cui B. Polystyrene negative resist for high-resolution electron beam lithography. Nanoscale Research Letters. 2011 Jul 12;6(1):446. doi: 10.1186/1556-276x-6-446.
creator	http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_69f8eec9eb49e486557edad6bfe38831 http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_1e7a5faaac3733d42f85bd87440f69c4 http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_c8fa0bcdc9d5c7e8a67fda766a81c108 http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_06dc5710d7e6be74623c8398f53b29fb
date	2011-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
identifier	https://pubmed.ncbi.nlm.nih.gov/PMC3211865 https://doi.org/10.1186/1556-276x-6-446 https://pubmed.ncbi.nlm.nih.gov/21749679
isPartOf	https://portal.issn.org/resource/ISSN/1556-276X https://portal.issn.org/resource/ISSN/1931-7573 http://rdf.ncbi.nlm.nih.gov/pubchem/journal/37703
language	English
source	https://www.crossref.org/ https://scigraph.springernature.com/ https://pubmed.ncbi.nlm.nih.gov/
title	Polystyrene negative resist for high-resolution electron beam lithography
discussesAsDerivedByTextMining	http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID197788 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID90766

Predicate	Subject
isDiscussedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID128376954 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID128654269 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID127676247 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID127669892 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID129706911 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID129674360

Total number of triples: 32.