reference/4553377

http://rdf.ncbi.nlm.nih.gov/pubchem/reference/4553377

Outgoing Links

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contentType	Journal Article\|Research Support, Non-U.S. Gov't
endingPage	1894
issn	1861-471X 1861-4728
issueIdentifier	7
pageRange	1888-1894
publicationName	Chemistry – An Asian Journal
startingPage	1888
bibliographicCitation	Sun X, Mu Y, Zhang J, Wang X, Hu P, Wan X, Guo Z, Lei S. Tuning the Self‐Assembly of Oligothiophenes on Chemical Vapor Deposition Graphene: Effect of Functional Group, Solvent, and Substrate. Chemistry An Asian Journal. 2014 May 18;9(7):1888–94. doi: 10.1002/asia.201402075.
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date	2014-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
identifier	https://pubmed.ncbi.nlm.nih.gov/24839081 https://doi.org/10.1002/asia.201402075
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language	English
source	https://www.crossref.org/ https://pubmed.ncbi.nlm.nih.gov/
title	Tuning the Self‐Assembly of Oligothiophenes on Chemical Vapor Deposition Graphene: Effect of Functional Group, Solvent, and Substrate
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Total number of triples: 52.