http://rdf.ncbi.nlm.nih.gov/pubchem/reference/4037620

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contentType Journal Article
issn 1099-4300
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pageRange 295-
publicationName Entropy (Basel, Switzerland)
startingPage 295
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bibliographicCitation Wang Y, Han T, Jiang X, Yan Y, Liu H. Path Planning of Pattern Transfer Based on Dual-Operator and a Dual-Population Ant Colony Algorithm for Digital Mask Projection Lithography. Entropy (Basel). 2020 Mar 03;22(3). PMID: 33286069; PMCID: PMC7516752.
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date 2020-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
identifier https://doi.org/10.3390/e22030295
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language English
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https://pubmed.ncbi.nlm.nih.gov/
title Path Planning of Pattern Transfer Based on Dual-Operator and a Dual-Population Ant Colony Algorithm for Digital Mask Projection Lithography

Total number of triples: 26.