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contentType |
Journal Article|Research Support, Non-U.S. Gov't |
endingPage |
1011 |
issn |
0893-228X 1520-5010 |
issueIdentifier |
7 |
pageRange |
1003-1011 |
publicationName |
Chemical Research in Toxicology |
startingPage |
1003 |
bibliographicCitation |
Roberts DW, Aptula AO, Patlewicz GY. Chemistry-based risk assessment for skin sensitization: quantitative mechanistic modeling for the S(N)Ar domain. Chem Res Toxicol. 2011 Jul 18;24(7):1003–11. doi: 10.1021/tx100420w. PMID: 21671633. |
creator |
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date |
2011-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
identifier |
https://doi.org/10.1021/tx100420w https://pubmed.ncbi.nlm.nih.gov/21671633 |
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https://portal.issn.org/resource/ISSN/0893-228X https://portal.issn.org/resource/ISSN/1520-5010 http://rdf.ncbi.nlm.nih.gov/pubchem/journal/1179 |
language |
English |
source |
https://www.crossref.org/ https://pubmed.ncbi.nlm.nih.gov/ |
title |
Chemistry-Based Risk Assessment for Skin Sensitization: Quantitative Mechanistic Modeling for the SNAr Domain |
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