| Predicate |
Object |
| contentType |
Journal Article|Research Support, Non-U.S. Gov't |
| endingPage |
5408 |
| issn |
1521-4095
0935-9648 |
| issueIdentifier |
45 |
| pageRange |
5404-5408 |
| publicationName |
Advanced materials (Deerfield Beach, Fla.) |
| startingPage |
5404 |
| bibliographicCitation |
Bauer WA, Neuber C, Ober CK, Schmidt HW. Combinatorial optimization of a molecular glass photoresist system for electron beam lithography. Adv Mater. 2011 Dec 01;23(45):5404–8. doi: 10.1002/adma.201103107. PMID: 22009688. |
| creator |
http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_72c82ba98d24ba0608506fca6400c607
http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_8649d257d292bf17308688a595f8a5b9
http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_64f788ba77a59873fb1f3018a79644a0
http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_aff452b7ef41d362a9c6830ee9b30ff5 |
| date |
2011-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| identifier |
https://doi.org/10.1002/adma.201103107
https://pubmed.ncbi.nlm.nih.gov/22009688 |
| isPartOf |
https://portal.issn.org/resource/ISSN/1521-4095
http://rdf.ncbi.nlm.nih.gov/pubchem/journal/30153
https://portal.issn.org/resource/ISSN/0935-9648 |
| language |
English |
| source |
https://pubmed.ncbi.nlm.nih.gov/
https://www.crossref.org/ |
| title |
Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography |
| discusses |
http://id.nlm.nih.gov/mesh/M0242969
http://id.nlm.nih.gov/mesh/M0029379
http://id.nlm.nih.gov/mesh/M0020792
http://id.nlm.nih.gov/mesh/M0000724
http://id.nlm.nih.gov/mesh/M0011048 |
| hasPrimarySubjectTerm |
http://id.nlm.nih.gov/mesh/D004583
http://id.nlm.nih.gov/mesh/D008027
http://id.nlm.nih.gov/mesh/D005898Q000737
http://id.nlm.nih.gov/mesh/D011327Q000379 |
| hasSubjectTerm |
http://id.nlm.nih.gov/mesh/D019800Q000737
http://id.nlm.nih.gov/mesh/D000480Q000737
http://id.nlm.nih.gov/mesh/D013451Q000737
http://id.nlm.nih.gov/mesh/D007093Q000737 |