http://rdf.ncbi.nlm.nih.gov/pubchem/reference/207388431
Outgoing Links
| Predicate | Object |
|---|---|
| contentType | Journal Article |
| endingPage | 236 |
| issn | 1573-2711 1023-8883 |
| issueIdentifier | 3 |
| pageRange | 225-236 |
| publicationName | Tribology Letters |
| startingPage | 225 |
| bibliographicCitation | Liu F, Sutcliffe MPF. Modelling of delamination of ultra low-k material during chemical mechanical polishing. Tribology Letters. 2006 Dec 09;25(3):225–36. doi: 10.1007/s11249-006-9171-z. |
| creator | http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_3491b0a2060953dd77712744137bd8f0 http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_83003a06ecddcb00b42750df93639170 |
| date | 2006-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| identifier | https://doi.org/10.1007/s11249-006-9171-z |
| isPartOf | https://portal.issn.org/resource/ISSN/1023-8883 http://rdf.ncbi.nlm.nih.gov/pubchem/journal/39237 https://portal.issn.org/resource/ISSN/1573-2711 |
| language | English |
| source | https://scigraph.springernature.com/ https://www.crossref.org/ |
| title | Modelling of delamination of ultra low-k material during chemical mechanical polishing |
Total number of triples: 20.