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Journal Article|Research Support, Non-U.S. Gov't |
| endingPage |
2475 |
| issn |
1996-9732
0273-1223 |
| issueIdentifier |
10 |
| pageRange |
2471-2475 |
| publicationName |
Water science and technology : a journal of the International Association on Water Pollution Research |
| startingPage |
2471 |
| bibliographicCitation |
Vilhunen SH, Sillanpää ME. Atomic layer deposited (ALD) TiO(2) and TiO(2-x)-N(x) thin film photocatalysts in salicylic acid decomposition. Water Sci Technol. 2009;60(10):2471–5. doi: 10.2166/wst.2009.660. PMID: 19923751. |
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| date |
2009-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| identifier |
https://pubmed.ncbi.nlm.nih.gov/19923751
https://doi.org/10.2166/wst.2009.660 |
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https://portal.issn.org/resource/ISSN/0273-1223
https://portal.issn.org/resource/ISSN/1996-9732 |
| language |
English |
| source |
https://www.crossref.org/
https://pubmed.ncbi.nlm.nih.gov/ |
| title |
Atomic layer deposited (ALD) TiO(2) and TiO(2-x)-N(x) thin film photocatalysts in salicylic acid decomposition |
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