| abstract |
A method for making a semiconductor device is disclosed which comprises the step of applying a functional layer on a substrate, characterised in that said substrate is a laminate which comprises a support and a glass layer, said glass layer having a thickness of less than 700 νm. The support is preferably a plastic foil. The laminate has the combined benefits of low weight and high strength and is therefore a suitable substrate for making flat panel displays such as liquid crystal displays, plasma displays, field emission displays or organic light-emitting polymer displays. Preferred examples of the functional layer are e.g. electroconductive layers, liquid crystal orientation layers, colour filters, electroluminescent layers, passivation layers and phosphor layers. |