http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9858731-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d29aa42f5cd370f60ad56b81b89865a8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_327013f228943ea1fd351792c4bd43e6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9e2155bc399d3769a049661aa6b8c608 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2035-0872 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0894 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-088 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-16 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C35-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-16 |
| filingDate | 1998-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d1375e5b65ad0c826e625d58acd5383 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86f0a06408f93a93d57097c1cc181b26 |
| publicationDate | 1998-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-9858731-A2 |
| titleOfInvention | Apparatus for exposing substrates to gas-phase radicals |
| abstract | A reactor for exposing substrates to a gas flow comprising gas-phase radicals to functionalize the substrates. The reactor includes a gas ionizer for generating gas-phase radicals in a flow of supply gas. The resulting ionized gas, including the gas-phase radicals, flows into a gas chamber. The gas chamber includes a substrate support which supports substrate materials so they are exposed to the gas-phase radicals contained within the gas flow. A decay zone is positioned between the substrates and the gas ioniser that allow harmful constituents contained within the flow to decay before reaching the substrates. A blocker is positioned between the gas ionizer and the substrates to prevent harmful ultraviolet radiation from striking the substrates. The gas chamber and substrate support are sized to allow a plurality of substrates to be introduced therein and simultaneously functionalized, permitting the reactor to be used for commercial-scale functionalization of the substrates. In one embodiment, the substrates are repositioned within the gas chamber to account for any gradients in concentration of the gas-phase radicals. In a further embodiment, a barrier within the gas chamber uniformly directs flow over the substrate support to convect the gas-phase radicals in close proximity to the substrates. In yet a further embodiment, a substrate moving device passes a continuous elongated substrate through the reaction zone. In still further embodiments the flow containing gas-phase radicals is directed toward the substrates from above or below the substrates to suspend the substrates in the flow. |
| priorityDate | 1997-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.