| abstract |
The present invention relates to a rinse-off antimicrobial cleansing composition comprising from about 0.1 % to about 5.0 % by weight of the cleansing composition, of an antimicrobial active; from about 4 % to about 18 % by weight of the cleansing composition, of an anionic surfactant, wherein at least about 67 % of the anionic surfactant is selected from the group consisting of Class A surfactants, Class C surfactants, and mitures thereof, wherein the ratio of Class A surfactant to Class C is from about 100:0 to about 1.5:1, from about 0.1 % to about 10 % , by weight of the cleansing composition, of a Class D acidic surfactants; from about 69.4 % to about 84.9 % by weight of the cleansing composition of water; wherein the composition is adjusted to a pH of greater than about 3.0 and less than about 5.5. The invention also encompasses methods for cleansing skin and providing residual effectiveness versus Gram negative bacteria using these products. |