http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9842790-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3a62c92e56568bd104089aac22ca487b |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 |
| filingDate | 1998-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aad83d4275a480483917faa5e52c347 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_832a56f5df651af9a4ffe745001c66b7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64696fb337211d5e45602c0cff9e6d06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e45b78748203561baf3b89b541c8f5c |
| publicationDate | 1998-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-9842790-A1 |
| titleOfInvention | Chemical-mechanical polishing slurry formulation and method for tungsten and titanium thin films |
| abstract | A polishing slurry composition and its method of making for planarization of silicon semiconductor wafers by chemical mechanical polishing of the wafer. A slurry formulation utilizing a ferric salt tungsten oxidizer, an ammonium persulfate titanium oxidizer, a fatty acid suspension agent, alumina particles with a small diameter and tight diameter range, coated with a solubility coating, and a chemical stabilizer, provides high tungsten and titanium polish rates with high selectivity to silicon dioxide, and good oxide defectivity for use in tungsten local interconnect applications. A method for making a tungsten slurry includes first thoroughly blending small diameter alumina particles with a tight diameter range in an aqueous concentrate with a suspension agent, then mixing with water and oxidizers. Ferric salt tungsten slurries made by this method provide excellent tungsten polish characteristics for via plug and local interconnect applications. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7803203-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0013218-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7964005-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8529680-B2 |
| priorityDate | 1997-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 127.