http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9840790-A1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6190399dc9b7ed0708640cd9afcd20c7 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D215-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D215-38 |
filingDate | 1998-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22ef02fea3e2d08d88be05107fba89a0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d55d1d9bcdfb3f2f48cad6388e683126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b32d1824555820995912ee6afeb8f486 |
publicationDate | 1998-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | WO-9840790-A1 |
titleOfInvention | Photosensitive quinolone compounds and a process of preparation |
abstract | The present invention relates to novel photosensitive quinolone compounds, specifically novel 3-diazo 2,4-quinolinedione compounds, that may be used in a variety of applications, such as, photosensitive coating compositions, pharmaceuticals, agricultural, amongst others. The invention further relates to a process for making the novel photosensitive 3-diazo 2,4-quinolinedione compounds. These compounds are particularly useful as a photoactive component in a positive working photoresist composition, particularly for use as a deep ultraviolet (UV) photoresist. |
priorityDate | 1997-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 262.