| abstract |
A system (10) for the deposition of a multicomponent material layer on a substrate (92) from respective liquid precursors (42, 46, 50, 54, 58, 62) for components of the multicomponent material layer, comprising: a vapor deposition zone (12); and multiple vaporizer units (18, 20), each of which is joined (i) to at least one source of liquid precursor (42, 46, 50, 54, 58, 62) for supplying at least one liquid precursor (42, 46, 50, 54, 58, 62) thereto, and (ii) in vapor flow communication with the vapor deposition zone (12) arranged to retain the substrate therein, for deposition on the substrate (92) of vapor phase species from precursor vapor formed by vaporization of liquid precursors (42, 46, 50, 54, 58, 62) in the vaporizer units (18, 20) of the system (10). |