http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9810118-A1

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-16
filingDate 1997-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79a8c89f90816661d4fdfd2e052288f2
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publicationDate 1998-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-9810118-A1
titleOfInvention Process for coating substrates with a silicium-containing protective layer by chemical vapour deposition
abstract A process is disclosed for coating substrates by chemical vapour deposition (CVD) with a silicium-containing protective layer. As starting compound a compound having structural formula (1) is used, in which R1 is an alkyl group with 1 to 4 carbon atoms; and R2 is hydrogen or an alkyl group with 1 to 4 carbon atoms.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7297649-B2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8242298-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7795461-B2
priorityDate 1996-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 36.