http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9803695-A1

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filingDate 1997-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1658596ff42db49b03eebec5e01d7561
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publicationDate 1998-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-9803695-A1
titleOfInvention Capped porous thin films
abstract A method of making vapor deposited thin films by rotating a substrate in the presence of an obliquely incident vapor flux. The substrate may be rotated about an axis normal to the surface of the substrate and/or parallel to the surface of the substrate by two motors mounted with their axes orthogonal to each other. A cap is formed on the thin film, for example by increasing the diffusion length of the material being deposited or by rotating the substrate about a plane parallel to the substrate (equivalent to changing the angle of incidence of the vapor flux). Feedback from a deposition rate monitor allows control of rotation speed of both motors to produce a growth with a defined pattern.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6998134-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10646622-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2945189-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8647654-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0225356-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0225356-A3
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priorityDate 1996-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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