| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ca2bebb163a7567f9860658e183d5848
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d19f9f9747fbeb6c7cd405246ac82eb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0bf38ca0f5328dfd092d2a1e588644cf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ca0eebb81831059c682402921c87b2e5 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-285 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-28 |
| filingDate |
1996-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e596bdf08e7e39b29269a3caa777de73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0f220154a1dbaa9f2c11221f5e73714
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_254b2a9481ea9bce8597af584ce64920 |
| publicationDate |
1997-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-9725278-A1 |
| titleOfInvention |
Process for purifying rinsing water used in semiconductor manufacture |
| abstract |
The hydrophilic organic impurities and hydrogen peroxide in rinsing water from semiconductor manufacturing processes are removed by adsorption on a pyrolysate of a macroreticular sulphonated vinyl aromatic polymer with a carbon content of at least 85 wt % and a carbon/hydrogen atomic ratio of 1.5:1 to 20:1. Despite their hydrophobic surface, the pyrolysates exhibit a high adsorbing capacity for these impurities and permit markedly higher removal rates than the usual active charcoals. |
| priorityDate |
1996-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |