| abstract |
A process and apparatus (100) for delivering an involatile solid source reagent material having a vapor pressure of less than about 0.1 torr at 25 °C and 1 atmosphere conditions, and which is thermally unstable at its vaporization temperature, as a source reagent material vapor into a CVD reactor (12) comprising a vaporization zone (22) and a flash vaporization matrix structure (26) for flash vaporizing the involatile solid source reagent material. The invention is particularly useful for delivery of Group II reagents and compounds and complexes of early transition metals such as zirconium and hafnium, and may be usefully employed with Group II beta-diketonate source reagents to form high temperature superconductor material layers as well as for forming interlayers of Group II metal fluorides between superconductor or gallium arsenide overlayers, and for depositing thin films of photonic and ferroelectric materials, e.g., BaTiO3, BaxSr1-xNb2O6, and PbZr1-xTixO3. |