| abstract |
The present invention involves photoprotective compositions which are useful for topical application to prevent damage to skin caused by acute or chronic exposure to ultraviolet light comprising chelating agents having formula (I) wherein each -R1 is independently selected from the group consisting of alkyl, aryl and heteroaryl, or the -R1's are covalently bonded together to form a cyclic alkyl; -R?2 and -R3¿ are -OR4, in which case there is no bond or a polar bond between -R2 and the nitrogen covalently bonded to -R3, each -R4 being independently selected from the group consisting of hydrogen, alkyl, aryl and heteroaryl except that both -R4 are not methyl when both -R1 are furyl; or -R2 is -O- and is covalently bonded to the nitrogen which is covalently bonded to -R3, and -R?3 is -O-¿ re furyl or the -R1'shere being a + charge on the nitrogen to which it is bonded) or nil; -NR2 and -NR3 are in amphi configuration when both are -OH, and when both -R1 are furyl or the -R1's are covalently bonded together to form a cyclohexanedione structure. Methods for using such compositions to prevent damage to skin caused by acute or chronic exposure to ultraviolet light are also involved. |