http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-8604617-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_14c9ad767fb6d5e9dabfb770d4e82252 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67748 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67173 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67207 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67751 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-14 |
| filingDate | 1986-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_315254a7a6b4509e6269899c36b7766e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f691307dcd398c4d75bad4d14a2a146e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee3edd5d2eea91f4e2496f3e9790ba3d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ff72d2dcbb3af5a323b0ba0d150e07c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ff65fb6cb27d3483993c1bdfab2d35d |
| publicationDate | 1986-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-8604617-A1 |
| titleOfInvention | System and method for depositing plural thin film layers on a substrate |
| abstract | A sealed substrate processing path has a plural selectably isolatable vacuum deposition chambers (12, 14, 16, 18, 20 and 22) along the path. A transporter carries substrates along the path and an independently controllable sputter deposition is performed in each deposition chamber (14, 16, 18, and 20) on substrate therein. Substrates are loaded from a load chamber (12) to a first deposition chamber (14) while vacuum is maintained in the first deposition chamber (14) and load chamber (12). Substrates are transferred from a last deposition chamber (20) to an unloaded chamber (22) while a vacuum is maintained in the last (20) and unload (22) chambers. Substrates are placed in the load chamber (12) while the load (12) and first (14) chamber are isolated and are removed from the unload chamber (22) while the last (20) and unload (22) chambers are isolated. In one embodiment, substrates travel successively from the load chamber (12) to first (14) through fourth (20) deposition chambers and then to unload chamber (22). In another embodiment, substrates travel from the load chamber (12) to first (14) to second (16) to first (14) and to third (18) deposition chambers and then to the unload chamber (22). |
| priorityDate | 1985-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 38.