Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_443fd3efcf16cdc200248506802bc3cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2af69219b6790ebad2fb441bbab05c02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_537889d4eb40518d22b82b7050ce090d |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B31-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-317 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-05 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B31-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317 |
filingDate |
1981-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_adf715b6b7fd07c88912b8afb5af5de1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f15eb0e1dbb4a04d63fd99502e95b4c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f17bec70cebfce1f83c7520893db8bc3 |
publicationDate |
1981-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-8103239-A1 |
titleOfInvention |
Ion implantation apparatus for semiconductor manufacture |
abstract |
An apparatus for implanting ions into the wafer (22) in the manufacture of a semiconductor device, especially an apparatus suitable for implanting double-charge ions into the wafer (22). Only those ions having predetermined masses are chosen by the mass-separation electromagnet (14) from among ion beams (12) originating from the ion source (10) and implanted into the wafer (22) through the slit (16). Between the slit (16) and the mass-separation electromagnet (14) are provided electrodes (24) for separating ions having different energy levels disposed with the direction of deflection parallel to that of the mass-separation electromagnet, and a deflective magnetic field (26) for separating neutral particles and so on disposed with the direction of deflection perpendicular to that of the mass-separation electromagnet. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105428193-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105428193-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0107320-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0107320-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4649316-A |
priorityDate |
1980-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |