http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-8002749-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eead32889928b6f007f6151f7bd8fc30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f4a33d3a18128d11ec15d6defa69dccf |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-115 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-115 |
| filingDate | 1980-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ab943cab9aff5efcdb9709c82635cc9 |
| publicationDate | 1980-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-8002749-A1 |
| titleOfInvention | Antireflection coating on a surface with high reflecting power and manufacturing process thereof |
| abstract | An anti-reflection (3) between a first medium (E) and a high reflection power layer of which the refraction indices (n1 and n2) are equal or approximately equal. The anti-reflection coating which retains any radiation having penetrated the first medium (E) is comprised of two layers of the same composition than the entrance medium and the reflecting layer, for example germanium and chromium, respectively. The anti-reflection coating (3) is provided by vaporisation and deposit of the appropriate material under high vacuum conditions, by controlling the thickness of the layers during the deposit by means of an oscillating quartz. |
| priorityDate | 1979-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.