http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022266449-A1

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filingDate 2022-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bce4ecdccc98d92affb8598ee7d263bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_966768d6174960907273a3e1b9fe1987
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publicationDate 2022-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2022266449-A1
titleOfInvention Gallium precursors for deposition of gallium-containing oxide films
abstract A method of deposition of a gallium-containing oxide film on a substrate comprises a) simultaneously or sequentially, exposing the substrate to a vapor of a gallium precursor, additional metal precursor(s) and an oxidizer; b) depositing at least part of the gallium precursor and at least part of the additional metal precursor(s) onto the substrate to form the gallium-containing oxide film on the substrate through a vapor deposition process, wherein the gallium precursor has the formula: (NR8R9)(NR1R2)Ga[(R3R4N)Cx(R5R6)(NR7)] (I) (Cy-N)2Ga[(R3R4N)Cx(R5R6)(NR7)] (II) wherein, R1 to R9 are independently selected from H, Me, Et, nPr, IPr, nBu, iBu, sBu, or tBu; R1 to R9 may be the same or different; x = 2, 3, 4, preferably x = 2; Cy-N refers to saturated N-containing rings or unsaturated N-containing rings.
priorityDate 2021-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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