| abstract |
The present invention provides a cleaning composition having excellent storage stability, a method for cleaning a semiconductor substrate, and a method for manufacturing a semiconductor element. The cleaning composition of the present invention includes a polycarboxylic acid, a chelating agent, a sulfonic acid having an alkyl group with 9-18 carbon atoms, and water. The mass ratio of the polycarboxylic acid to the chelating agent is 10-200, the mass ratio of the polycarboxylic acid to the sulfonic acid is 70-1000, the pH is 0.10-4.00, and the electrical conductivity is 0.08-11.00 mS/cm. |