| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D17-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-34 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D17-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2022-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd95339f6533a61c8e7f94acde46b4a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9cc9ccffa31b8a092f6edd7dcb7a989 |
| publicationDate |
2022-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2022255220-A1 |
| titleOfInvention |
Processing solution, method for cleaning semiconductor substrate, and method for manufacturing semiconductor element |
| abstract |
The present invention addresses the problem of providing: a processing solution that has excellent removing characteristics for hydrophobic anti-corrosive agents, and also excellent suppressing characteristics for copper surface roughness; a method for cleaning a semiconductor substrate; and a method for manufacturing a semiconductor element. This processing solution includes: at least one specific compound selected from the group consisting of a quaternary ammonium compound containing quaternary ammonium cations having a total carbon number of five or more, and a quaternary phosphonium compound containing quaternary phosphonium cations having a total carbon number of five or more; a sulfur-containing compound; and a solvent. |
| priorityDate |
2021-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |