http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022253787-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eccd894c99fea2d1c0c8735872bb2309 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate | 2022-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd1105be6df043eec0ff4bdb517c0b10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bff84b177132cf3cb20c922d923a89ca |
| publicationDate | 2022-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2022253787-A1 |
| titleOfInvention | Method for using composition comprising organic acid compound, lithography composition comprising organic acid compound, and method for manufacturing resist pattern |
| abstract | [Problem] A method for reducing standing wave in a lithography process is provided. [Means for Solution] A method for using a composition comprising an organic acid compound (AA) having a certain structure to reduce standing wave in a lithography process. The distance between the antinode (3) and the node (4) in the direction parallel to the substrate (2) is referred to as the internode distance (5). The internode distance (5) / desired pattern width is referred to as the standing wave index. By reducing standing wave that appears in the resist pattern (1), pattern collapse, which is caused due to undesired shape or formation of a notch, is suppressed and stable formation of a finer pattern is facilitated. |
| priorityDate | 2021-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 513.