http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022245038-A1

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filingDate 2022-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1ad494a16055149eaa77757802e9741
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publicationDate 2022-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2022245038-A1
titleOfInvention Non-woven fabric, for facial mask, having excellent adhesiveness and water retention, and manufacturing method thereof
abstract The present invention provides non-woven fabric, for a facial mask, having excellent adhesiveness and water retention by absorbing an alkaline solution alone or a combination of the alkaline solution and a modifying additive into cellulose non-woven fabric, and then aging same, and a manufacturing method thereof. The non-woven fabric for a facial mask according to the present invention comprises surface-modified cellulose non-woven fabric, the surface-modified cellulose non-woven fabric having adhesiveness (d2/d1) of 1.58 or lower when measured by immersing in water, and having water retention of 30% or higher measured by means of Corneometer CM825. (The water retention is the amount of moisture absorbed, d1 is the gap for a clip fixing the upper end part of the non-woven fabric for a facial mask, and d2 is the average width length of the intermediate part and the lower end part of the non-woven fabric for a facial mask.)
priorityDate 2021-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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