http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022228892-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6901e829e26733789fefe005adcacd79 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29D11-00298 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-1852 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29D11-00798 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-1857 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F9-7042 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F9-00 |
| filingDate | 2022-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b080653c1e67ccd84fb802275daee12 |
| publicationDate | 2022-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2022228892-A1 |
| titleOfInvention | Multi-level structure fabrication |
| abstract | A substrate (200) is provided having a multi-layer structure (202) disposed thereon. The multi-layer structure includes a plurality of meta-layers, each meta-layer including a hard mask layer (206a-d) including a hard mask material, and a spacer layer (208a-c) on which the hard mask layer is disposed, the spacer layer including a spacer material. A replication material is disposed on a surface of the multi-layer structure. A replication pattern including a first replication feature (212a) and a second replication feature (212b, 212c) is imprinted into the replication material. The first replication feature and the second replication feature have different heights. A plurality of etching processes are performed on the replication material, the multi-layer structure, and the substrate, to obtain a substrate pattern including a first substrate feature and a second substrate feature. |
| priorityDate | 2021-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.