http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022227080-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9ac9854f7c14230fc7a0d34c23901263 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12M1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C12M1-34 |
| filingDate | 2021-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4f8f6e7effbf95fa190fee75b0df464 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02c460ac9aa3315c9ee591608d418e79 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a2b5686764c429e7ba98541e2a0c3f0 |
| publicationDate | 2022-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2022227080-A1 |
| titleOfInvention | Pore array layer structure, chip device, nanopore sequencing device, and film forming method and use thereof |
| abstract | Disclosed in the present application are a pore array layer structure, a chip device, a nanopore sequencing device, and a film forming method and the use thereof. The pore array layer structure is used for forming a film forming space with a substrate, and the film forming space is used for forming a film layer. The pore array layer structure comprises a plurality of pore units arranged in an array, wherein the pore unit penetrates the pore array layer structure, and the pore unit has a first accommodating cavity and a second accommodating cavity, which are in axial communication, the first accommodating cavity being configured to be connected to the substrate, and at least one first accommodating cavity communicating with other first accommodating cavities. By means of the pore array layer structure provided in the present application, the serial complementation and uniform distribution of first non-polar media among different first accommodating cavities can be realized, thereby guaranteeing the uniformity of pre-coating and providing a better film forming basis for film forming. In addition, the stability and serial complementation of a film layer can also be guaranteed at a film forming stage. |
| priorityDate | 2021-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.