| abstract |
In accordance with the examples of the present disclosure, a photo-definable hydrophobic composition ("composition") is presented. The composition can include from about 0.01 wt% to about 20 wt% of a polyether modified siloxane and from about 80 wt% to about 99.99 wt% of a polymeric photoresist. The polymeric photoresist can be selected from an epoxy-based photoresist, a bisbenzocyclobutene-based photoresist, a poiyimide-based photoresist, a polybenzoxazole-based photoresist, a polyimide-polybenzoxazole-based photoresist, an admixture, or a combination thereof. |