http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022159783-A1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_78e5c03bdc07e251b3d53c2fa2262f0d |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12R2001-32 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12N1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12N11-08 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07K1-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C12N1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07K16-12 |
filingDate | 2022-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5407fcc03f36f6b0d194dc97fffa0c40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f32caeb82a595e1ab74dd24af8c9907 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d89cf900ecbfa4bca500676af0dee76b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45502fd592232be82962f83b15d0235b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_231b83c6afad3a1536fe9289f7e258d5 |
publicationDate | 2022-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | WO-2022159783-A1 |
titleOfInvention | Apparatus and methods for selective capture of mycobacteria |
abstract | A device for selectively capturing mycobacteria comprises a substrate and a capture polymer layer of poly-diallyldimethyl ammonium chloride, wherein the capture polymer layer is covalently linked onto the substrate via a UV-initiated polymerization reaction of a solution comprising diallyldimethyl ammonium chloride and a photoinitiator in water purged of dissolved oxygen, and wherein the UV exposure time is 30 seconds to 4 minutes at a power density of about 20 to about 25 mW/cm2. A kit can comprise the device. A microfluidic chip comprises at least a portion of at least one channel sidewall coated with a capture polymer layer of poly-diallyldimethyl ammonium chloride. A method for manufacturing the device includes plasma treating a substrate, providing a solution comprising diallyldimethyl ammonium chloride and a photoinitiator in water purged of dissolved oxygen, and coating the plasma-treated substrate via a UV-initiated polymerization reaction. |
priorityDate | 2021-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 56.