http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022059448-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-22 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 2021-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_299e81f5a72b392abdb219280feebbf3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87b99267f268944f21d923986e01fb50 |
| publicationDate | 2022-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2022059448-A1 |
| titleOfInvention | Method for producing resist pattern, resist pattern and positive photosensitive resin composition for production of transparent multilayer member |
| abstract | The present invention provides a method for producing a resist pattern, said method enabling the achievement of a fine resist pattern having high heat resistance, wherein a dilute weak alkaline developer solution is able to be used. The present invention specifically provides a method for producing a resist pattern, said method comprising: a coating film formation step wherein a coating film is formed on a base material; a light exposure step wherein the coating film is exposed to light; and a development step wherein the coating film after the light exposure step is developed by means of a dilute weak alkaline developer solution. With respect to this method for producing a resist pattern, the coating film contains: a novolac-type phenolic resin (A) which uses, as essential reactant materials, an aldehyde compound and a phenolic hydroxyl group-containing compound that contains an aromatic compound (a) represented by general formula (1), wherein 80% by mole or more of constituent units derived from the phenolic hydroxyl group-containing compound are constituent units (a) derived from the aromatic compound (a); and a sensitizing agent (B). |
| priorityDate | 2020-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 195.