| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8bb531ac161ea927fd276b48f26bc7af |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-80 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-398
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04 |
| filingDate |
2021-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7415d3deffab14de6399b4fd265bcfa5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dc5358f223fdd0388d53797d52e1bef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a122de7585e2d03fc5b08669987a505 |
| publicationDate |
2022-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2022022728-A1 |
| titleOfInvention |
Patterning material and patterned film |
| abstract |
Provided is a patterning material, comprising a polysiloxane. The polysiloxane comprises at least one cyclic structure formed by repeating Si-O bonds and an organic group attached to the Si atom in the cyclic structure, wherein some of the Si atoms in at least one of the cyclic structures are replaced by a metal element, and/or at least one of the organic groups comprises a halogen element. The patterning material of the present application has a high sensitivity and a high pattern resolution under the irradiation of 1-15 nm X-rays, and can achieve a high-quality and high-efficiency patterning process. The patterning material of the present application is used for preparing electronic components such as chips, and the accuracy and the preparation efficiency of the electronic components can be improved. Also provided is a patterned film formed by the patterning material. |
| priorityDate |
2020-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |