http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021221171-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8205ec6ee1cd95eb60a03826535bad97 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-26 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0275 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-311 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2021-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67122eda1f3f0267f4b4dbc1c16012df http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb1e0e86c2cf7848714344e42591e60b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d26202d366193a30f2471879d7ce63b9 |
| publicationDate | 2021-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2021221171-A1 |
| titleOfInvention | Composition for forming resist underlying film |
| abstract | [Problem] To provide: a composition that is for a silicon-containing resist underlying film and that is for forming a resist underlying film that can be removed not only by a conventional method employing dry etching, but also by a method employing wet etching using a chemical liquid such as dilute hydrofluoric acid, buffered hydrofluoric acid, or alkaline chemical liquid, in a step for processing a semiconductor substrate or the like; and a composition that is for forming a resist underlying film for lithography and that is for forming a resist underlying film that has excellent storage stability and produces less residue in a dry etching step. [Solution] A composition for forming a resist underlying film, the composition comprising a hydrolysis-condensation product of a hydrolysable silane mixture containing an alkyltrialkoxy silane and a hydrolysable silane represented by formula (1), wherein the contained amount of the alkyltrialkoxy silane in the hydrolysable silane mixture is 0 mol% or more but less than 40 mol% with respect to the total number of moles of all of the hydrolysable silane contained in the hydrolysable silane mixture. (In formula (1), R1 represents an organic group that bound to a silicon atom and that contains at least one group or backbone selected from the group consisting of succinic anhydride backbones, a vinyl group, a phenyl group, and isocyanuric acid backbones, each R2 independently represents an optionally substituted alkyl group or the like bound to a silicon atom, each R3 independently represents a group or atom that is bound to a silicon atom and that is an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom, a represents 1, b represents an integer of 0-2, and 4-(a+b) represents an integer of 1-3.) |
| priorityDate | 2020-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 42.