| abstract |
A multilayer structure which contains at least a barrier resin layer (X) and an inorganic barrier layer (Y) that is arranged adjacent to the barrier resin layer (X), while having a thickness of 500 nm or less, and which is characterized in that: the layer (X) is formed of a resin composition (x) that contains an ethylene-vinyl alcohol copolymer (A) and a polyamide (B) at a mass ratio (A/B) of from 55/45 to 98/2; and the ethylene-vinyl alcohol copolymer (A) has an ethylene content of from 20% by mole to 46% by mole and a saponification degree of 90% by mole or more. Consequently, the present invention provides: a multilayer structure which has excellent gas barrier properties and excellent appearance even if a bending process is performed after a stretching process or a retort process; and a packaging material for retort, said packaging material using this multilayer structure. |