http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021187324-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2021-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e399e76a6095744d8f560d698ccc0fe7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40a1ac5b357e55548262a1e59476b10f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_100b3701cb74511aa5c4a361d3b5b8dc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_476a43c8706bcc2fef167c115841d83f |
| publicationDate | 2021-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2021187324-A1 |
| titleOfInvention | Negative photosensitive resin composition, pattern structure and method for producing patterned cured film |
| abstract | The present invention provides a novel photosensitive resin composition, specifically a negative photosensitive resin composition which is based on a polysiloxane. This negative photosensitive resin composition contains (A) a polysiloxane compound which contains a first constituent unit represented by general formula (1), (B) a photo-inducible curing accelerator and (C) a solvent. (1): ((Rx)bRl mSiOn/2) (In general formula (1), Rx represents a monovalent group represented by general formula (1a); Rl represents a substituent that is selected from the group consisting of a hydrogen atom, an alkyl group having from 1 to 3 carbon atoms, a phenyl group, a hydroxy group, an alkoxy group having from 1 to 3 carbon atoms, and a fluoroalkyl group having from 1 to 3 carbon atoms; b represents a number from 1 to 3; m represents a number that is not less than 0 but less than 3; n represents a number that is more than 0 but not more than 3; (b + m + n) = 4; and in cases where there are a plurality of Rx moieties and a plurality of Rl moieties, each of those moieties independently represents one of the constituents. In general formula (1a), X represents a hydrogen atom; a represents a number from 1 to 5; and the broken line represents a bonding hand.) |
| priorityDate | 2020-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.