| abstract |
The present invention concerns a method for altering adhesion properties of a surface of a substrate by a coating, comprising the steps of: a) ionizing a plasma gas at low temperature and at atmospheric pressure, thereby creating a plasma with a plasma temperature of at most 50°C; b) introducing a precursor into a plasma gas afterglow of said plasma; c) subjecting the surface of the substrate to said plasma comprising said precursor, thereby forming a coating onto said surface, whereby said plasma gas is essentially completely comprised of inert gas, and whereby said coating alters the adhesion properties of the surface. |