| abstract |
Provided are a radiation-sensitive resin composition capable of exhibiting an adequate level of sensitivity, CDU performance, and LWR performance, and a method for forming a pattern. The radiation-sensitive resin composition includes the onium salt compound represented by formula (1'), a resin including a structural unit having an acid-cleavable group, and a solvent. (Here, E A is a substituted or unsubstituted, (α+β)-valent organic group having 1 to 40 carbon atoms; Z + is a monovalent radiation-sensitive onium cation; and α and β are each independently 1 or 2.) |