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publicationDate 2021-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2021128503-A1
titleOfInvention Photoresist material and preparation method therefor, and colour film substrate
abstract A photoresist material and a preparation method therefor, and a colour film substrate, the photoresist material comprising oligomer segments, the chemical structural formula thereof being (I), and the value of n being 1-2.
priorityDate 2019-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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