| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eb2648e65ad8850515bd727a122f1186
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0534e551838bc80048214c5c27970d07 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-5825
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M2004-028 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G33-006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4417
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-366
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F17-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
2020-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_551f626b3184a5d4f705163a466f81ff
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96954bc6f11337e0cf427f3f7cb7c3bf |
| publicationDate |
2021-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2021127467-A1 |
| titleOfInvention |
Group v element-containing film forming compositions and vapor deposition of group v element-containing film |
| abstract |
Methods for forming a Group V-containing film comprise: a) exposing a substrate to a vapor of a Group V-containing film forming composition; b) exposing the substrate to a co-reactant; and c) repeating the steps of a) and b) until a desired thickness of the Group V-containing film is deposited on the substrate using a vapor deposition process. |
| priorityDate |
2019-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |