| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D7-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-042 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-26 |
| filingDate |
2020-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_809b7f9c948e72c20c11a7cafd10d348
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba57dcf6ea00d6e7ecb55031177c087a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5039ec38b163a6052c5a7a37428917f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_372b4726ec492b67e64176c170b77da4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbed42c249a7603ed024e4711f5aad1b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9fdbb7f4c9fa4e9eb7f314666e1d0199
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14d7f062b039fbeccfe049a396ab80ca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2b78423c7c81befb95b6447be6762d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c856e4df469ef98aa2c6e08ca59fa12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd4713bd97c09edfda6950001f413925 |
| publicationDate |
2021-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2021126470-A1 |
| titleOfInvention |
Polishing pads having selectively arranged porosity |
| abstract |
Polishing pads having discrete and selectively arranged regions of varying porosity within a continuous phase of polymer material are provided herein. In one embodiment a polishing pad features a plurality of polishing elements each comprising a polishing surface and sidewalls extending downwardly from the polishing surface to define a plurality of channels disposed between the polishing elements, wherein one or more of the polishing elements is formed of a continuous phase of polymer material having one or more first regions comprising a first porosity and a second region comprising a second porosity, wherein the second porosity is less than the first porosity. |
| priorityDate |
2019-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |