http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021106636-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B37-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00 |
| filingDate | 2020-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8060670b74fce67f2fecb37d058ea800 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c143998e6d2a5e37084439d7c13150e0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89d96f9acc9d9554417babea3db37b3c |
| publicationDate | 2021-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2021106636-A1 |
| titleOfInvention | Laminated film production method |
| abstract | An embodiment of the present invention provides a laminated film with which it is possible to suppress winding displacement and defects caused by foreign matter.　This method uses plasma-enhanced chemical vapor deposition to produce a laminated film including a substrate, and at least one inorganic thin-film layer formed on at least one surface of the substrate. Said method comprises: a step (I) in which a rolled substrate is advanced so as to unwind from a roller; a step (II) in which a reaction gas and a feedstock gas are supplied to between a pair of film-forming rollers, and an inorganic thin-film layer is formed on at least one side of the transported substrate as a result of plasma discharge generated between the rollers so as to obtain a laminated film; and a step (III) in which the laminated film is wound up by a winding roller. In step (I), the absolute value of the electric charge amount of the substrate surface during said unwinding is 2.0 kV or more when measured in the atmosphere. In steps (II) and (III), after formation of the inorganic thin-film layer and until said film is wound up, the absolute value of the electric charge amount of the inorganic thin-film layer surface is 1.5 kV or less when measured in a vacuum. |
| priorityDate | 2019-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 86.