http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021100256-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c19a91365ed494d9fe27d24190d4459f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2020-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_292bb1a9bba7ee6003a4a05857397e36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_229012202239e27e5ccccf75f41cc950 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10de882f93c61726e7c57302d4a443a7 |
| publicationDate | 2021-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2021100256-A1 |
| titleOfInvention | Resist removal solution |
| abstract | Provided is a resist removal solution that suppresses undercutting of copper and molybdenum when removing a resist that has been hard-baked on a lamination film of copper/molybdenum.　This resist removal solution is characterized by containing 0.5-5 mass% of a secondary cyclic amine with respect to the total amount of the removal solution, 5-10 mass% of a basic amino acid with respect to the secondary cyclic amine, 10-30 mass% of a protective agent with respect to the basic amino acid, 10-50 mass% of a sugar alcohol with respect to the secondary cyclic amine, an organic polar solvent, and water. |
| priorityDate | 2019-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 58.