http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021089425-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6635a0116bafd2c08a0c99b78e132e99 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-305 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45574 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45561 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45523 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate | 2020-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ecf951e88b1f10683b0637e33b421d0c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43a8c7404edcfbf0dad2ef51cbcd9b08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_069493ee84a527e7c79213117f4ac871 |
| publicationDate | 2021-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2021089425-A1 |
| titleOfInvention | Method for depositing a two-dimensional coating and cvd reactor |
| abstract | The invention relates to a method for depositing a two-dimensional coating on at least one substrate (4) in a CVD reactor (1), in which by means of a supply line (10, 20) a process gas is fed into a gas distribution chamber (11, 21) of a gas inlet member (2) which has a first gas distribution chamber (11) and at least one second gas distribution chamber (21) separate from the first gas distribution chamber, and in which the substrate (4) is brought to a process temperature (Tp) by means of a heating device. According to the invention, to deposit heterostructures, in a first step, an inert gas or a diluent gas is fed into the first gas distribution chamber (11) and a reactive gas containing the elements of a first two-dimensional coating is fed into the second gas distribution chamber, which reactive gas is pyrolytically decomposed in the process chamber (3), wherein the decomposition products form the two-dimensional first coating, and that in a second step, a second coating is deposited above and/or adjacent to the first coating, wherein a diluent gas is fed into the second gas distribution chamber (21) and a reactive gas containing the elements of a second two-dimensional coating is fed into the first gas distribution chamber (11), which reactive gas or which gas mixture is decomposed in the process chamber (3), wherein the decomposition products form the second two-dimensional coating. |
| priorityDate | 2019-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 41.